LFE

LFE PFS/PCrE/PDS-501 ICP Barrel Plasma Etch System 115V 300W Semiconductor

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SKU:
44794
MPN:
PFS/PCrE/PDS-501
Condition:
Used
Availability:
This item requires freight shipping. Contact us for a shipping quote before purchasing.
Weight:
282.00 LBS
Shipping:
Calculated at Checkout
  • LFE Corporation PFS/PCrE/PDS-501 ICP barrel plasma etch system — full right-front view showing teal cabinet with control panel on right side, sitting on a wooden pallet
  • LFE PFS/PCrE/PDS-501 — front door open showing copper-shielded barrel reactor chamber with red O-ring door seal and perforated metal sample tray inside
  • LFE PDS-501 plasma etch system — side view of barrel reactor chamber showing stainless steel end bell with bellows vacuum fitting and copper RF shielding enclosure
  • LFE PFS/PCrE/PDS-501 — rear left view with side access panel open showing empty interior compartment shelf and rear exhaust fan
  • LFE PDS-501 barrel etch system — front-left view with main chamber door open, exposing full barrel reactor, copper shielding, and lower base assembly on pallet
  • LFE PFS/PCrE/PDS-501 — interior base compartment open showing three relay modules, wiring harness, and lower electrical components
  • LFE PFS/PCrE/PDS-501 — front panel and chamber door both open; LFE Process Control Division nameplate and model designation PFS/PCrE/PDS-501 visible on top fascia; barrel reactor chamber open showing red O-ring seal and perforated tray
  • LFE Corporation PFS/PCrE/PDS-501 — close-up of upper front nameplate showing LFE Corporation Process Control Division branding and model number PFS/PCrE/PDS-501 with a data label (serial number area)
  • LFE PFS/PCrE/PDS-501 — close-up of main control panel showing RF Power Monitor analog meter, Simpson DC Volts digital display, Power and RF Power toggle switches, Cycle Select rotary switch, Cycle Start and Vacuum Release toggles, and Cycle Complete indicator button
  • LFE PDS-501 control panel — lower section showing three process zones (Clean, Etch, Strip) each with RF Power rotary control, Gas Flow indicator lamp, and Eagle Signal electromechanical Min:Sec timer displays
  • LFE PFS/PCrE/PDS-501 — front view with main door fully open showing complete barrel reactor chamber with large circular red-sealed door opening, perforated sample tray, and copper RF shielding surround
  • LFE PDS-501 — close-up of lower front black panel showing multi-pin diagnostic TESTER connector
  • LFE PFS/PCrE/PDS-501 — right side access panel open showing complex gas plumbing interior with multiple solenoid valves (labeled V7, V8, V11 and others), gas tubing, wiring harness, transformer, and a Dwyer rotameter flow meter
  • LFE PFS/PCrE/PDS-501 — rear view of full cabinet showing teal sheet metal enclosure, two indicator lights and power cable on rear left panel, large round power inlet cutout, and base-mounted regulator/control panel
  • LFE PDS-501 barrel plasma etch system — rear-left three-quarter view showing full cabinet exterior on pallet with rear fan grille visible on right side panel
  • LFE PFS/PCrE/PDS-501 — close-up of rating plate showing: Model PFS/PCrE/PDS-501, 115 Volts, 50/60 Cycles, Serial 93515, Watts 300; LFE Corporation Process Control Division, Waltham Mass.
  • LFE PFS/PCrE/PDS-501 — interior upper compartment panel showing array of approximately 15 relay modules mounted on aluminum plate with wiring, and a small gray component box
  • LFE PDS-501 — top interior access panel open showing HIGH VOLTAGE labeled section with dense wiring, relay board, additional relay array on right, and orange RF component module at top
  • LFE PFS/PCrE/PDS-501 — top deck interior showing AT-2 labeled RF matching network/tuner box, an RF coil/inductor assembly, and variable capacitor tuning components
  • LFE PFS/PCrE/PDS-501 — interior electronics compartment showing dense wiring, multiple circuit boards, transformers, solenoid components, and a blue switching power supply module
  • LFE PFS/PCrE/PDS-501 ICP Barrel Type Plasma Chrome Etch System - As Is
  • LFE PFS/PCrE/PDS-501 ICP Barrel Type Plasma Chrome Etch System - As Is
$1,500.00
Was: $3,000.00
Current Stock: 1

Sold Out

Description

LFE PFS/PCrE/PDS-501 ICP Barrel Plasma Etch System 115V 300W Semiconductor

The LFE Corporation PFS/PCrE/PDS-501 is an ICP barrel-type plasma processing system built by LFE's Process Control Division in Waltham, Massachusetts. It is designed to perform plasma clean, etch, and photoresist strip operations on semiconductor wafers and substrates within a cylindrical RF-excited barrel reactor chamber. The system integrates RF power generation, gas flow control, process sequencing, and vacuum management into a single self-contained floor-standing cabinet.

Specifications & What's Included

  • Manufacturer: LFE Corporation, Process Control Division, Waltham, MA
  • Model: PFS/PCrE/PDS-501
  • Power: 115V AC, 50/60 Hz, 300W
  • Interior barrel diameter: 13.5 inches
  • Overall dimensions: 36" W x 34" D x 32" H
  • Approximate weight: 240 lbs (freight shipping required)
  • Process modes: Clean, Etch, Strip, Etch-Strip, Clean-Etch-Strip (rotary Cycle Select switch)
  • RF Power Monitor: front-panel analog meter (Forward and Reflected power)
  • DC Volts display: Simpson digital panel meter
  • Three independent process zones (Clean, Etch, Strip), each with: RF Power rotary control, Gas Flow indicator, and Eagle Signal electromechanical Min:Sec countdown timer
  • Front panel controls: Power, RF Power, Cycle Start, Vacuum Release, Cycle Complete indicator/alarm
  • Barrel reactor: copper RF-shielded enclosure with large circular door, red O-ring vacuum seal, and perforated stainless sample tray
  • Stainless steel end bell with bellows vacuum port fitting on barrel left end
  • Internal gas plumbing: multiple solenoid valves (labeled V7, V8, V11 and others visible), gas tubing manifold, Dwyer rotameter flow meter
  • RF matching network: AT-2 labeled tuner box with variable capacitor and RF inductor coil assembly (visible on top deck)
  • Internal relay panel: approximately 15 relay modules on aluminum plate
  • High-voltage section with additional relay array (labeled HIGH VOLTAGE — internal access panel)
  • Multi-pin diagnostic TESTER connector on lower front panel
  • Integrated rear exhaust/cooling fan
  • Freestanding cabinet form factor

Applications

Barrel plasma etch systems like the LFE PFS/PCrE/PDS-501 were widely used in semiconductor device fabrication for isotropic plasma etching, photoresist stripping (ashing), and surface cleaning of wafers and substrates. The barrel geometry exposes a batch of wafers simultaneously to an RF-excited plasma generated inside the cylindrical chamber, making these systems practical for photoresist removal after lithography, oxide cleaning, and chromium etch steps in photomask fabrication — the "PCrE" designation in the model name reflects its use in chrome (Cr) etch processes. These systems were standard equipment in semiconductor fabs, photomask shops, university research cleanrooms, and microelectronics production lines from the 1970s through the 1990s, when barrel etch systems began to be supplemented by single-wafer RIE (reactive ion etch) tools for more demanding anisotropic etch requirements. They remain of interest for legacy fab support, research applications, chrome mask processing, and parts sourcing.

Condition: For Parts or Not Working
This LFE Corporation PFS/PCrE/PDS-501 ICP Barrel Plasma Etch System is being sold as-is for parts or repair. The unit is physically intact and appears to be in good cosmetic condition overall — the cabinet shows typical age-related wear consistent with lab use, and the barrel reactor chamber, copper RF shielding, control panel, gas plumbing, and internal wiring are all present and visible in the photos. However, one of the interior compartments is missing a component, and for that reason the system is being offered as-is with no guarantee of functionality. It has not been tested or powered up at our facility. This item requires freight shipping due to its size and weight (approximately 240 lbs). Please view our photo set and contact us if you have any questions.
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Warranty Information

We stand behind every item we sell with a 30-day money-back guarantee. If your item arrives not as described, you may return it within 30 days for a full refund. Please inspect your purchase upon arrival and contact us with any questions.
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Additional Information

Brand:
LFE Corporation
Model:
PFS/PCrE/PDS-501
MPN:
PFS/PCrE/PDS-501
Type:
ICP Barrel Plasma Etch System
SKU:
44794
Condition:
As-Is / For Parts or Not Working
Seller Notes:
One compartment has a missing component. Sold as-is for parts or repair. Freight shipping required.
Country/Region of Manufacture:
United States
Manufacturer Division:
LFE Process Control Division
Manufacturer Location:
Waltham, Massachusetts
Voltage:
115V
Power Rating:
300W
Frequency:
50/60 Hz
Interior Barrel Diameter:
13.5 inches
Overall Dimensions:
36" W x 34" D x 32" H
Process Modes:
Clean, Etch, Strip, Etch-Strip, Clean-Etch-Strip
RF Power Monitor:
Forward and Reflected, analog meter
DC Volts Display:
Simpson digital DC Volts meter
Cycle Timers:
3 independent electromechanical timers (Min:Sec) for Clean, Etch, Strip
Gas Flow Controls:
3 independent RF Power and Gas Flow controls (Clean, Etch, Strip)
Front Panel Controls:
Power, RF Power, Cycle Select, Cycle Start, Vacuum Release, Cycle Complete
Tester Connector:
Multi-pin diagnostic connector on lower front panel
Cooling:
Integrated exhaust fan
Application:
Semiconductor plasma etching, photoresist stripping, chrome etch
Form Factor:
Freestanding Cabinet
Shipping Method:
Freight Required
Condition Notes:
LFE PFS/PCrE/PDS-501 ICP Barrel Plasma Etch System sold as-is for parts/repair. Physically intact with good cosmetic condition overall, but one interior compartment has a missing component. Not tested. Freight shipping required (~240 lbs).
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Power Requirements:
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Cooling:
Liquid coolant in/out connections on rear
Vacuum Connection:
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DC Bias:
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Sold as-is for parts. Includes mass flow controller, control boards, gas plumbing, load/unload stations, and power cable.
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