Description
Tegal 803 Inline Automatic Wafer RF Plasma Etcher Semiconductor Etch System
RF plasma dry etch tool designed for automated inline semiconductor wafer processing. Performs plasma-based material removal and surface modification on silicon wafers during semiconductor fabrication.
Specifications & What's Included
- Model: Tegal 803 inline automatic wafer etcher
- Process: RF plasma etch (dry etch)
- Gas system: Four process gas channels plus dedicated cleaning gas input with mass flow controller module
- RF power supply: Intact and present
- Wafer handling: Inline automatic transport mechanism
- Control: Front panel digital displays and switches
- Form factor: Freestanding benchtop/floor unit on casters
Applications
The Tegal 803 was used in semiconductor manufacturing lines for dry etching processes, including dielectric and metal etching steps. Inline automatic systems of this type are integrated into wafer processing sequences where batch or semi-batch etch operations are required. Typically found in production environments processing 150mm and 200mm wafers.
Condition: For Parts or Not Working
This Tegal 803 Inline Automatic Wafer RF Plasma Etcher is being sold as-is for parts or repair. We were unable to test this system, so no functionality is guaranteed. The RF power supply is present and intact. Covers were removed for the photo set to give a clear view of the internal components, which appear largely complete including the reactor chamber, gas manifold, mass flow controller, wiring harnesses, and multiple PCBs. Note that the main power cable shows bare, corroded wire ends and will require attention before any use. The unit is on casters and weighs approximately 400 lbs — freight shipping is required. Please carefully review the full photo set and contact us with any questions before purchasing.
This Tegal 803 Inline Automatic Wafer RF Plasma Etcher is being sold as-is for parts or repair. We were unable to test this system, so no functionality is guaranteed. The RF power supply is present and intact. Covers were removed for the photo set to give a clear view of the internal components, which appear largely complete including the reactor chamber, gas manifold, mass flow controller, wiring harnesses, and multiple PCBs. Note that the main power cable shows bare, corroded wire ends and will require attention before any use. The unit is on casters and weighs approximately 400 lbs — freight shipping is required. Please carefully review the full photo set and contact us with any questions before purchasing.
Warranty Information
We stand behind every item we sell with a 30-day money-back guarantee. If your item arrives not as described, you may return it within 30 days for a full refund. Please inspect your purchase upon arrival and contact us with any questions.
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Additional Information
Brand: |
Tegal |
Model: |
803 |
MPN: |
803 |
Type: |
Inline Automatic Wafer RF Plasma Etcher |
SKU: |
42618 |
Condition: |
As-Is / For Parts or Not Working |
Seller Notes: |
RF power supply intact; sold as-is for parts or repair; freight shipping required |
Country/Region of Manufacture: |
United States |
Application / Use Case: |
Semiconductor wafer plasma etching, dry etch processing |
Process Type: |
RF Plasma Etch (Dry Etch) |
Wafer Handling: |
Inline automatic wafer transport |
Gas Inputs: |
Multiple gas channels (Gas 1, Gas 2, Gas 3, Gas 4, Cleaning Gas) |
Mass Flow Controller: |
Mass flow controller module present (visible internally) |
RF Power Supply: |
Intact (confirmed present) |
Form Factor: |
Freestanding benchtop/floor unit on casters |
Control Interface: |
Front panel digital displays and switches |
Approximate Weight: |
~400 lbs (freight shipping required) |
Condition Notes: |
Tegal 803 RF Plasma Etcher sold as-is for parts or repair. We were unable to test it; no functionality guaranteed. RF power supply intact. Power cable ends show corrosion. ~400 lbs, freight required. |
