Description
Tegal 803 Plasma Inline RF Wafer Etcher Semiconductor Etch Tool For Parts
Inline RF plasma wafer etcher designed for semiconductor processing. This motorized system performs reactive ion etching (RIE) on wafers using four process gas lines and automated wafer transport.
Specifications & What's Included
- Model: Tegal 803 (Serial: 8030293)
- Type: Inline RF Plasma Etcher with motorized wafer handler
- Process Gas Inputs: 4 dedicated lines plus cleaning gas
- Control Parameters: RF watts, vacuum (Torr), gas flow/MFC, temperature, process and wafer status
- Connections: Vacuum pump port, coolant in/out, heavy-duty multi-pin power connector
- All major internal components present; cover removed
Applications
The Tegal 803 is used for RF plasma etching in semiconductor manufacturing, including pattern transfer and material removal on silicon wafers. This inline configuration integrates with automated wafer processing lines for high-volume production. The system was designed to work within Tegal 803 series process module environments common in semiconductor fabrication facilities.
This Tegal 803 Plasma Inline RF Wafer Etcher is being sold as-is for parts or repair. It has not been tested and no functionality is guaranteed. The top cover has been removed for photos to show the internal components, which appear largely intact — the reaction chamber, RF matching network, gas delivery manifold with MFC plumbing (four process gas lines plus cleaning gas), motorized wafer transport arms on both sides, control PCBs, and the main control chassis are all present. The chassis exterior shows the typical yellowing and surface oxidation of aged gold-anodized aluminum. Internal wiring harnesses and ribbon cables are visible and appear connected. This is a heavy system at approximately 400 pounds and will require freight shipping — please contact us before purchasing to arrange freight logistics. Please view our full photo set and contact us if you have any questions.
Warranty Information
Additional Information
Brand: |
Tegal |
Model: |
803 |
MPN: |
803 |
Type: |
Inline RF Plasma Wafer Etcher |
SKU: |
42622 |
Condition: |
As-Is / For Parts or Not Working |
Seller Notes: |
Sold as-is for parts or repair. Cover removed; all major components present. |
Country/Region of Manufacture: |
United States |
Serial Number (Internal): |
8030293 |
Application / Use Case: |
RF Plasma Etching, Semiconductor Wafer Processing |
Process Type: |
RF Plasma Etch (Reactive Ion Etch / RIE) |
Configuration: |
Inline Automatic |
Gas Inputs: |
4 process gas lines (GAS 1, GAS 2, GAS 3, GAS 4) + cleaning gas |
Control Panel: |
Volts/Torr, % Flow/MFC, Temperature, Watts, Process Status, Wafer Status |
Vacuum Connection: |
To Vacuum Pump port visible on rear panel |
Coolant Connections: |
Coolant In / Coolant Out ports on rear panel |
Power Connection: |
Heavy-duty multi-pin plug (visible in photos) |
Power Outlets: |
Chart & Service Power Outlets, 24 VAC, DC Supply on control chassis |
Form Factor: |
Freestanding Inline System |
Approximate Weight: |
~400 lbs — freight shipping required |
Wafer Handler: |
Motorized inline wafer transport with end effectors on both sides |
Interlock: |
Top cover interlock and Interlock Reset present |
Compatible With: |
Tegal 803 series plasma etch process modules |
Manufacturer Location: |
Tegal Corporation, Novato, CA 94947 |
Condition Notes: |
Tegal 803 Plasma Inline RF Wafer Etcher sold as-is for parts or repair. Untested, no functionality guaranteed. Major internal components present. ~400 lbs, freight required. Please review photos and contact us with questions. |