Description
MRC 603-III RF DC Sputtering System 3-Target 208V 3-Phase PVD Thin Film
Three-target RF/DC magnetron sputtering system for physical vapor deposition of thin films. Freestanding floor system with load-lock chamber, cryogenic vacuum pumping, and substrate heating capability.
Specifications & What's Included
- 1.5 kW RF power supply, 3 kW DC power supply
- Three sputtering targets with RF, DC, and DC magnetron modes
- 8-inch CTI Cryo-Tor cryopump, LN2 cryotrap
- Load-lock chamber: approximately 13 × 13 inch capacity
- Substrate heater and Omega optical pyrometer
- RF bias on substrate with adjustable phase
- Power requirements: 208V, 160A, 60Hz, 3-phase
Applications
RF/DC magnetron sputtering systems are used for semiconductor, solar cell, and optical coating processes. The MRC 603-III supports deposition of metals, oxides, nitrides, and other materials onto wafers and substrates. Typical applications include hard coatings, barrier layers, and functional thin films in research and production environments.
Condition: For Parts or Not Working
This MRC 603-III RF/DC Sputtering System is being sold as-is. The system was reassembled and moved into storage, but the facility was shut down before it could be commissioned or tested — it has not been powered up or leak-checked following its last move. As a result, we make no representation as to its current operational status. Buyers intending to put the system back into service should plan to perform a full vacuum leak check before applying power. The system is available for in-person inspection at our facility in Ventura, CA, and we encourage serious buyers to do so. Externally, the system shows general wear consistent with its age and prior industrial use. The main chamber interior shows heat discoloration and sputtering residue on the target shields, which is normal for a used sputtering system. All three target positions are present and visible; the load-lock bays appear intact. The CTI cryopump compressor, high-voltage power cabinet, vacuum control panel, and operator console are all included and visible in the photos. Please view our full photo set and contact us with any questions before purchasing.
This MRC 603-III RF/DC Sputtering System is being sold as-is. The system was reassembled and moved into storage, but the facility was shut down before it could be commissioned or tested — it has not been powered up or leak-checked following its last move. As a result, we make no representation as to its current operational status. Buyers intending to put the system back into service should plan to perform a full vacuum leak check before applying power. The system is available for in-person inspection at our facility in Ventura, CA, and we encourage serious buyers to do so. Externally, the system shows general wear consistent with its age and prior industrial use. The main chamber interior shows heat discoloration and sputtering residue on the target shields, which is normal for a used sputtering system. All three target positions are present and visible; the load-lock bays appear intact. The CTI cryopump compressor, high-voltage power cabinet, vacuum control panel, and operator console are all included and visible in the photos. Please view our full photo set and contact us with any questions before purchasing.
Warranty Information
We stand behind every item we sell with a 30-day money-back guarantee. If your item arrives not as described, you may return it within 30 days for a full refund. Please inspect your purchase upon arrival and contact us with any questions.
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Additional Information
Brand: |
Materials Research Corporation (MRC) |
Model: |
603-III |
MPN: |
1620-8 |
SKU: |
50528 |
Condition: |
As-Is / For Parts or Not Working |
Seller Notes: |
Includes CTI cryopump, LN2 cryotrap, 3kW power supply, Omega pyrometer, vacuum control panel |
Country of Manufacture: |
USA |
Form Factor: |
Freestanding Floor System, Multi-Cabinet |
Power Requirements: |
208V, 160A, 60Hz, 3-Phase |
Application / Use Case: |
RF/DC Magnetron Sputtering, PVD Thin Film Deposition |
Number of Targets: |
3 |
Sputtering Modes: |
RF, DC, DC Magnetron |
RF Power Supply: |
1.5 kW RF |
DC Sputtering Power Supply: |
3kW |
Vacuum System: |
8-inch CTI Cryogenics Cryo-Tor Cryopump |
Additional Vacuum: |
LN2 Cryotrap for water vapor pumping |
Load-Lock: |
Yes — approx. 13 x 13 inch work holder capacity |
Substrate Heating: |
Yes — substrate heater included |
Temperature Measurement: |
Omega Optical Pyrometer |
RF Bias: |
RF bias on substrate supported; adjustable RF phase |
Compatible With: |
PVD semiconductor, solar, and optical coating processes |
Shipping Method: |
Freight — two pallets required |
Inspection Available: |
Yes — Ventura, CA |
Condition Notes: |
MRC 603-III RF/DC Sputtering System sold as-is. System was moved into storage and never powered or tested after last move. Vacuum leak check required before use. Inspection available in Ventura, CA. No functionality guaranteed. |
