Material Research Corp

MRC 603-III RF DC Sputtering System 3-Target 208V 3-Phase PVD Thin Film

Material Research Corp

SKU:

50528

Availability:

This item requires freight shipping on two pallets. Contact us for a freight quote and to arrange inspection in Ventura, CA.

Weight:

5,000.00 LBS

Brand:

Materials Research Corporation (MRC)

Model:

603-III

MPN:

1620-8

SKU:

50528

Condition:

As-Is / For Parts or Not Working

Seller Notes:

Includes CTI cryopump, LN2 cryotrap, 3kW power supply, Omega pyrometer, vacuum control panel

Country of Manufacture:

USA

Form Factor:

Freestanding Floor System, Multi-Cabinet

Power Requirements:

208V, 160A, 60Hz, 3-Phase

Application / Use Case:

RF/DC Magnetron Sputtering, PVD Thin Film Deposition

Number of Targets:

3

Sputtering Modes:

RF, DC, DC Magnetron

RF Power Supply:

1.5 kW RF

DC Sputtering Power Supply:

3kW

Vacuum System:

8-inch CTI Cryogenics Cryo-Tor Cryopump

Additional Vacuum:

LN2 Cryotrap for water vapor pumping

Load-Lock:

Yes — approx. 13 x 13 inch work holder capacity

Substrate Heating:

Yes — substrate heater included

Temperature Measurement:

Omega Optical Pyrometer

RF Bias:

RF bias on substrate supported; adjustable RF phase

Compatible With:

PVD semiconductor, solar, and optical coating processes

Shipping Method:

Freight — two pallets required

Inspection Available:

Yes — Ventura, CA

Condition Notes:

MRC 603-III RF/DC Sputtering System sold as-is. System was moved into storage and never powered or tested after last move. Vacuum leak check required before use. Inspection available in Ventura, CA. No functionality guaranteed.