Material Research Corp

MRC 603-III RF DC Sputtering System 3-Target 208V 3-Phase PVD Thin Film

Material Research Corp

SKU:

50528

Availability:

This item requires freight shipping on two pallets. Contact us for a freight quote and to arrange inspection in Ventura, CA.

Weight:

5,000.00 LBS

Brand:

Materials Research Corporation (MRC)

Model:

603-III

MPN:

1620-8

SKU:

50528

Condition:

As-Is / For Parts or Not Working

Seller Notes:

Includes CTI cryopump, LN2 cryotrap, 3kW power supply, Omega pyrometer, vacuum control panel

Country of Manufacture:

USA

Form Factor:

Freestanding Floor System, Multi-Cabinet

Power Requirements:

208V, 160A, 60Hz, 3-Phase

Application / Use Case:

RF/DC Magnetron Sputtering, PVD Thin Film Deposition

Number of Targets:

3

Sputtering Modes:

RF, DC, DC Magnetron

RF Power Supply:

1.5 kW RF

DC Sputtering Power Supply:

3kW

Vacuum System:

8-inch CTI Cryogenics Cryo-Tor Cryopump

Additional Vacuum:

LN2 Cryotrap for water vapor pumping

Load-Lock:

Yes — approx. 13 x 13 inch work holder capacity

Substrate Heating:

Yes — substrate heater included

Temperature Measurement:

Omega Optical Pyrometer

RF Bias:

RF bias on substrate supported; adjustable RF phase

Compatible With:

PVD semiconductor, solar, and optical coating processes

Shipping Method:

Freight — two pallets required

Inspection Available:

Yes — Ventura, CA

Condition Notes:

MRC 603-III RF/DC Sputtering System sold as-is. System was moved into storage and never powered or tested after last move. Vacuum leak check required before use. Inspection available in Ventura, CA. No functionality guaranteed.

California Prop 65 Warning:

WARNING: This product can expose you to chemicals including lead and lead compounds, and DEHP (a phthalate), which are known to the State of California to cause cancer and birth defects or other reproductive harm. Go to P65Warnings.ca.gov