Energy Research Associates PPS 8205 MF Slave DC Plasma Power Supply 5KW 1000V

Energy Research Associates PPS 8205 MF Slave DC Plasma Power Supply 5KW 1000V

The Energy Research Associates PPS 8205 MF is a high-voltage DC plasma power supply designed to operate as a slave unit paired with the ERA PPS 8210 MF master controller. It accepts three-phase 208 VAC input and delivers up to 5 KW of regulated DC output at voltages up to 1000 VDC, with current output that scales with the selected voltage. This is a floor-standing cabinet unit mounted on heavy-duty casters, built for industrial plasma processing applications.

Specifications & What's Included

• Model: Energy Research Associates PPS 8205 MF (Slave Unit)
• Input: 208 VAC, Three-Phase (3-PH), 60 Hz
• Output Power: 5 KW DC
• Output at 600 VDC: 11.25 Amps
• Output at 800 VDC: 8.43 Amps
• Output at 1000 VDC: 6.75 Amps
• Maximum Output Voltage: 1000 VDC
• Configuration: Slave unit — requires ERA PPS 8210 MF master (not included; no longer available from manufacturer)
• Input Connector: 4-prong twist-lock plug (yellow, heavy-duty industrial style)
• Output Connectors: Two blue high-current cable connectors (rear panel)
• Circuit Protection: Dual 30A breakers (visible on side panel)
• Cooling: Internal forced-air fan (rear-mounted)
• Internal Components: Large three-phase transformer, three oil-filled filter capacitors (490 650 815), high-voltage transformer assembly (red, with DANGER HIGH VOLTAGE label), toroidal inductors, control PCBs, and ERA sub-assembly module (Model T-2517, S/N 10789)
• Form Factor: Floor-standing cabinet on four heavy-duty casters
• Dimensions: 30" W x 14" D x 32" H
• Manufactured by: Energy Research Associates, 503 F Vandell Way, Campbell, CA 95008

Applications

DC plasma power supplies of this type were used in physical vapor deposition (PVD) and plasma-enhanced processes common to the semiconductor fabrication, flat-panel display, and hard-coating industries. In a PVD sputtering system, high-voltage DC power excites a plasma discharge within a vacuum chamber, causing target material to be ejected and deposited as a thin film on a substrate. The ERA PPS 8205 MF slave configuration was typical of systems requiring precise, high-voltage DC regulation across a range of operating points — the master/slave architecture allowed the master unit to handle system control and regulation while the slave provided additional power capacity. Energy Research Associates was a Campbell, California-based manufacturer active in the 1970s–1990s that produced DC and RF plasma power systems for research and production semiconductor environments. Equipment of this generation was commonly found in university research labs, government facilities, and early commercial semiconductor fabs during the period when plasma processing was becoming a standard step in IC and thin-film manufacturing.