Description
Thomas Swan Epison II MOCVD 1x2 Quartz Reactor Lepel T-7.5-3-KC-SW RF Heater
Metal Organic Chemical Vapor Deposition (MOCVD) system designed for compound semiconductor epitaxial growth. Consists of a 1x2 vertical quartz reactor chamber with water-cooled Lepel RF induction heater, freestanding cabinet on casters, and integrated gas flow and temperature control.
Specifications & What's Included
- Model: Thomas Swan Epison II / EPITOR
- Reactor: 1x2 vertical quartz chamber with graphite susceptor
- RF Heater: Lepel T-7.5-3-KC-SW (460V, 3-Ph, 60Hz, 21A, 16.7 KVA)
- System Power: 208V, 3-Phase, 60Hz, 32A
- Included: Reactor, Lepel RF heater, two Epison II gas monitors, Tylan 2900 MFC
- Temperature Control: Newport Electronics 269 TF digital thermometer
- Dimensions: 96"L x 42"D x 90"H (Thomas Swan unit)
- Not included: Johnson Matthey HP-100 Hydrogen Purifier
Applications
Compound semiconductor R&D and epitaxial deposition of III-V materials including GaAs and InP.
Condition: Used
This Thomas Swan Epison II MOCVD 1x2 quartz reactor system with Lepel RF induction heater was recently removed from an R&D laboratory. The system appears complete but has not been fully tested. The Johnson Matthey HP-100 Hydrogen Purifier shown in the photo set is NOT included in this sale. Please review our full photo set carefully and contact us with any questions before purchasing.
This Thomas Swan Epison II MOCVD 1x2 quartz reactor system with Lepel RF induction heater was recently removed from an R&D laboratory. The system appears complete but has not been fully tested. The Johnson Matthey HP-100 Hydrogen Purifier shown in the photo set is NOT included in this sale. Please review our full photo set carefully and contact us with any questions before purchasing.
Warranty Information
We stand behind every item we sell with a 30-day money-back guarantee. If your item arrives not as described, you may return it within 30 days for a full refund. Please inspect your purchase upon arrival and contact us with any questions.
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Additional Information
Brand: |
Thomas Swan Scientific Equipment |
Model: |
Epison II |
Secondary Model: |
EPITOR |
MPN: |
T-7.5-3-KC-SW |
SKU: |
47342 |
Condition: |
Used – Pulled from R&D Lab, Appears Complete, Not Fully Tested |
Seller Notes: |
Includes reactor, Lepel RF heater, 2x Epison II gas monitors, Tylan 2900 MFC. No H2 purifier. |
Form Factor: |
Freestanding Cabinet System on Casters |
Application / Use Case: |
MOCVD / OMVPE epitaxial deposition, compound semiconductor R&D |
Process Type: |
Metal Organic Chemical Vapor Deposition (MOCVD / OMVPE) |
Reactor Configuration: |
1x2 vertical quartz reactor chamber |
RF Heater Model: |
Lepel T-7.5-3-KC-SW (water-cooled RF induction heater) |
RF Heater Power Requirements: |
460V, 3-Phase, 60Hz, 21A, 16.7 KVA |
Thomas Swan Power Requirements: |
208V, 3-Phase, 60Hz, 32A |
RF Heater Type: |
T-75.1-163-2 (Type per nameplate) |
Gas Flow Control: |
Tylan 2900 Series Mass Flow Controllers (MFC) |
Gas Monitors: |
Two Thomas Swan Epison II gas concentration monitors |
RF Power Controller: |
Control Concepts Model 3629C |
Circuit Breaker: |
Westinghouse Series C FDB14k, 25A, 3-Pole |
Gas Valve: |
Nor-Cal Products ESV-1002-NWB |
Year Installed: |
1995 |
Thomas Swan System Dimensions: |
96"L x 42"D x 90"H |
Lepel Unit Dimensions: |
43"L x 31"D x 58"H |
Temperature Control: |
Integrated temperature controller (Newport Electronics 269 TF, 08 digital thermometer) |
Susceptor Type: |
Graphite susceptor, inductively heated |
Not Included: |
Johnson Matthey HP-100 Hydrogen Purifier (shown in photos but not part of sale) |
Country of Manufacture: |
United Kingdom |
Compatible With: |
III-V compound semiconductor epitaxial growth (GaAs, InP, etc.) |
Condition Notes: |
This Thomas Swan Epison II MOCVD 1x2 quartz reactor system with Lepel RF induction heater was recently removed from an R&D laboratory. The system appears complete but has not been fully tested. |