Advanced Energy Paramount Plus 6060 VHF RF Generator 31550260-663 – Used

Advanced Energy Paramount Plus 6060 VHF RF Generator 31550260-663 – Used

The Advanced Energy Paramount Plus 6060 is an industrial-grade VHF RF (radiofrequency) power generator purpose-built for plasma-based semiconductor manufacturing, wafer processing, and materials processing applications. This benchtop RF generator delivers stable, high-frequency energy to critical fab operations and plasma process chambers requiring reliable RF power input. As a core component in plasma deposition, etch, and ion implantation systems, the Paramount Plus 6060 represents industrial-duty design for 24/7 manufacturing environments.

This RF generator features integrated water cooling for efficient thermal management, three-phase AC power input rated up to 40A for factory floor stability, and a 6.9 bar water pressure rating designed for continuous process control. The compact, integrated design facilitates straightforward mounting and integration into existing RF delivery systems and impedance-matching networks. Advanced Energy's engineering ensures precise frequency delivery and system compatibility with standard plasma chamber configurations and production workflows.

Specifications & What's Included

• Manufacturer: Advanced Energy Industries
• Model: Paramount Plus 6060
• Part Number: 31550260-663
• Secondary Reference: 660-189197R100
• Frequency Band: VHF (Very High Frequency)
• Power Input: Three-phase AC, 40A maximum input current
• Thermal Management: Integrated water cooling system, 6.9 bar pressure rating
• Form Factor: Benchtop / Integrated RF generator unit
• Condition: Used, pulled from working manufacturing environment
• Included: RF generator unit only (no power supply, cables, or manual unless noted separately)

Ideal Applications

The Paramount Plus 6060 VHF RF generator is designed for semiconductor and materials processing facilities requiring stable, high-frequency plasma power. Typical applications include plasma-enhanced chemical vapor deposition (PECVD), reactive ion etching (RIE), ion implantation systems, thin-film deposition, surface treatment, and custom plasma chamber integration where VHF RF power and precise frequency control are critical to process repeatability and product quality.

Please note: We may have multiple units of this item in stock. The unit you receive may vary slightly from the one shown in the photos. All units are functionally equivalent and inspected to the same standard.