PTFE Benchtop Wafer Etch Bath Recirculating Filter Washer 23.25x15x16.5 As-Is

PTFE Benchtop Wafer Etch Bath Recirculating Filter Washer 23.25x15x16.5 As-Is

This is a custom-fabricated PTFE (polytetrafluoroethylene) benchtop wafer etch bath with an integrated recirculating filter system. The unit features a lidded main bath chamber, a perforated PTFE wafer carrier plate, a dedicated wafer rinse section, an external pump/filter housing on the underside, and multiple PVC plumbing fittings for fluid inlet and outlet connections. It is being sold as-is due to damage to the lid.

Specifications & What's Included

• Material: PTFE (Polytetrafluoroethylene) throughout — chemically resistant construction
• Outer Dimensions: 23.25" x 15" x 16.5"
• Inner Dimensions: 20.25" x 11.25" x 11.25"
• Wafer Rinse Section Dimensions: 17.5" x 8.75" x 10" deep
• Lid: PTFE lid with carry handle — damaged (see condition notes)
• Interior: PTFE perforated wafer carrier/cassette plate
• Lower interior shelf with drain fitting and small O-ring port fitting
• External pump/filter housing mounted on underside of bath body
• Cylindrical pump/filter roller visible inside external housing
• Multiple PVC threaded plumbing fittings on exterior walls (inlet/outlet ports)
• Four PVC fittings on bottom corner panel (mix of straight and elbow connectors)
• Two PVC fittings on right side panel
• Form Factor: Benchtop
• Sold as-is — no pump motor, controller, or power components included/confirmed

Applications

PTFE recirculating etch baths are used in semiconductor and microelectronics fabrication for wet chemical processing of silicon wafers — including etching, cleaning, and rinsing steps using aggressive chemistries such as HF (hydrofluoric acid), BOE (buffered oxide etch), KOH, and similar etchants. PTFE is the material of choice for these baths precisely because it is inert to virtually all acids, bases, and solvents encountered in wet bench processing, and it does not contaminate process chemistry. The recirculating filter design circulates bath chemistry through a filter to remove particles and extend bath life, maintaining cleaner process conditions. This type of benchtop bath is found in semiconductor R&D labs, university cleanrooms, MEMS fabrication, solar cell manufacturing, and compound semiconductor processing facilities. The integrated wafer carrier section holds wafer cassettes or individual wafers during chemical treatment. Units like this are also used for III-V wafer processing (GaAs, InP) and for precision optical substrate cleaning where compatibility with strong acids or bases is required.