Disc Master Ultrasonic Cleaning Bench Skyey Generator Flow Hood 440V 3-Phase

Disc Master Ultrasonic Cleaning Bench Skyey Generator Flow Hood 440V 3-Phase

This is a large-scale, multi-zone ultrasonic cleaning workstation designed for precision disc, wafer, and small-parts cleaning in semiconductor, optical, or disk manufacturing environments. The system integrates two Skyey ultrasonic generators, a laminar flow hood (Air Tech SS-MAC MAC-101), dual independent cleaning zones (D.I. Water Only and D.I. Water with Soap), a motorized disc/wafer spin station, a center rinse sink, and a full complement of temperature, timer, and process controls — all housed in a stainless steel benchtop frame on locking casters.

Specifications & What's Included

• Power Input: 440V AC, 30 Amp, 3-Phase
• Plug installed: 480 VAC, 30 Amp
• Ultrasonic Output Power: 600W (per generator nameplate)
• Overall dimensions: 81" L x 46" W x 89" H
• Left work area: 25.5" x 20.5" x 34"
• Right work area: 49" x 20.5" x 40"
• Center sink dimensions: 15.5" x 15.5" x 14"
• Rotating drum/cylinder: Diameter 15.5", Height 9"
• Qty 2 — Skyey Ultrasonic Generator
• Qty 1 — Air Tech SS-MAC MAC-101 laminar flow hood (HEPA filter panel with fluorescent and spot lamps)
• Qty 3 — Fuji Electric MD4E Digital Timer
• Qty 5 — Conch Digital Panel Meter (amperage/voltage display)
• Qty 2 — Omron E5CST Temperature Controller
• Qty 2 — HLA Regulated DC Power Supply
• Qty 1 — Chelic DU-40 Air Cylinder
• Pan World NH-200PS-3J Magnetic Drive Circulation Pump (150W, 200/400V, 50/60Hz, 1" ports) — visible x2 under bench
• Inline water filtration (Pacific filter housing with sediment bowl in rear plumbing circuit)
• Motorized disc/wafer spin turntable with center hub and pin carrier array
• Two flush-mounted rectangular ultrasonic bath tanks inset into perforated stainless steel work surface
• Stainless steel center rinse sink with faucet
• Control panels: emergency stop, lights, filtration, heater on/off, electrolysis (auto/manual), ultrasonic on/off, spin controls, timer, and RPM display
• Stainless steel frame and work surfaces; locking casters for mobility
• Included accessories (as shown in photos): blue plastic disc carrier, stainless steel wafer ring, instrument tray with cable/probe, and two white wafer arm fixtures

Applications

Ultrasonic cleaning benches of this type are purpose-built for precision cleaning in semiconductor wafer fabrication, optical disc (CD/DVD) manufacturing, and precision optics or microelectronics production environments. The combination of DI water-only and DI water-with-soap independent zones allows sequential cleaning steps — removing particulates and organic contamination in a controlled laminar-flow enclosure that prevents recontamination from airborne particles. The Skyey ultrasonic generators drive high-frequency acoustic cavitation in the cleaning baths, loosening sub-micron particles from disc and wafer surfaces without mechanical abrasion. The motorized spin station allows centrifugal drying or rinsing of disc substrates in place. Temperature controllers and digital timers provide repeatable, recipe-driven process control for consistent cleaning results across production runs. This type of integrated cleaning bench was widely used in optical disc manufacturing — particularly in the CD and DVD era of the 1990s through 2000s — as well as in compound semiconductor and MEMS fabrication labs requiring particle-free substrate preparation. Equipment of this scale and configuration remains relevant wherever precision wet cleaning is performed under controlled conditions.